NanoMaker Pattern Generation System for SEM and FIB Direct Write Lithography
The NanoMaker Pattern Generation System (NPGS) is a direct write tool for scanning electron microscopes (SEM) and focused ion beam (FIB) lithography, as well as for dual beam and STEM
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e-beam EBL VSB variable shaped beam direct mask write elektronenstrahllithographie electron beam lithography lithografie litografia
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Use RegexMagic to generate complete regular expressions to your specifications by using RegexMagic's flexible patterns, instead of the cryptic regex syntax.
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enables correlated analysis of electron microscope image and Raman spectroscopy of objects; correlative imaging; Raman spectroscopy integrated to electron microscopy; Raman; electron microscopy; nanoscale morphology; research; Raman chemical analysis of a wide range of materials nanotechnology; biotechnology; materials research;correlative imaging in semiconductor; correlative imaging in food industry; correlative imaging in pharmaceutical industry; correlative imaging in forensic sciences; nanopartic